The Resource Chemical vapor deposition modeling for high temperature materials : prep. for 1991 Hall meeting of the Materials Research Society, Boston, Massachusetts, December 2-6, 1991, Süleyman A. Gökoǧlu, (microform)

Chemical vapor deposition modeling for high temperature materials : prep. for 1991 Hall meeting of the Materials Research Society, Boston, Massachusetts, December 2-6, 1991, Süleyman A. Gökoǧlu, (microform)

Label
Chemical vapor deposition modeling for high temperature materials : prep. for 1991 Hall meeting of the Materials Research Society, Boston, Massachusetts, December 2-6, 1991
Title
Chemical vapor deposition modeling for high temperature materials
Title remainder
prep. for 1991 Hall meeting of the Materials Research Society, Boston, Massachusetts, December 2-6, 1991
Statement of responsibility
Süleyman A. Gökoǧlu
Creator
Contributor
Subject
Language
eng
Member of
Cataloging source
GPO
http://library.link/vocab/creatorName
Gokoglu, Suleyman A.
Government publication
federal national government publication
Index
no index present
Literary form
non fiction
http://library.link/vocab/relatedWorkOrContributorName
United States
Series statement
NASA TM
Series volume
105386
http://library.link/vocab/subjectName
  • Coating
  • Reaction kinetics
  • Refractory materials
  • Thermochemistry
  • Vapor deposition
Label
Chemical vapor deposition modeling for high temperature materials : prep. for 1991 Hall meeting of the Materials Research Society, Boston, Massachusetts, December 2-6, 1991, Süleyman A. Gökoǧlu, (microform)
Instantiates
Publication
Note
Shipping list no.: 92-1415-M
Carrier category
microfiche
Carrier category code
  • he
Carrier MARC source
rdacarrier
Color
black and white
Content category
text
Content type code
  • txt
Content type MARC source
rdacontent
Control code
39727485
Dimensions
4x6 in. or 11x15 cm.
Emulsion on film
diazo
Extent
1 volume
Form of item
microfiche
Generation
first generation master
Media category
microform
Media MARC source
rdamedia
Media type code
  • h
http://library.link/vocab/ext/overdrive/overdriveId
19920009215
Positive negative aspect
negative
http://bibfra.me/vocab/marc/reductionRatio
02
ReductionRatioRange
normal reduction
Reproduction note
Microfiche
Specific material designation
microfiche
Label
Chemical vapor deposition modeling for high temperature materials : prep. for 1991 Hall meeting of the Materials Research Society, Boston, Massachusetts, December 2-6, 1991, Süleyman A. Gökoǧlu, (microform)
Publication
Note
Shipping list no.: 92-1415-M
Carrier category
microfiche
Carrier category code
  • he
Carrier MARC source
rdacarrier
Color
black and white
Content category
text
Content type code
  • txt
Content type MARC source
rdacontent
Control code
39727485
Dimensions
4x6 in. or 11x15 cm.
Emulsion on film
diazo
Extent
1 volume
Form of item
microfiche
Generation
first generation master
Media category
microform
Media MARC source
rdamedia
Media type code
  • h
http://library.link/vocab/ext/overdrive/overdriveId
19920009215
Positive negative aspect
negative
http://bibfra.me/vocab/marc/reductionRatio
02
ReductionRatioRange
normal reduction
Reproduction note
Microfiche
Specific material designation
microfiche

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